Technology evolution for silicon nano-electronics : selected, peer reviewed papers from the proceedings of the International Symposium on Technology Evolution for Silicon Nano-Electronics 2010, June 3-5, 2010, Tokyo Institute of Technology, Tokyo, Japan / edited by Seiichi Miyazaki and Hitoshi Tabata.

Silicon ultra-large scale integrated circuits (ULSIs) are now faced with various physical limits to further scaling. Therefore, it is very important to establish the fundamental science and technology required to produce nano-scale complementary metal-oxide-semiconductor devices (Nano-CMOS) having h...

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Bibliographic Details

Online Access:	Full Text (via ProQuest)
Corporate Author:	International Symposium on Technology Evolution for Silicon Nano-Electronics Tokyo Institute of Technology
Other Authors:	Miyazaki, Seiichi, Tabata, Hitoshi
Other title:	Proceedings of the International Symposium on Technology Evolution for Silicon Nano-Electronics. International Symposium on Technology Evolution for Silicon Nano-Electronics.
Format:	Conference Proceeding eBook
Language:	English
Published:	Stafa-Zurich, Switzerland ; Enfield, N.H. : Trans Tech Publications, ©2011.
Series:	Key engineering materials ; v. 470.
Subjects:	Nanoelectronics > Congresses. Nanostructured materials > Congresses. Metal oxide semiconductors > Congresses. Metal oxide semiconductors. Nanoelectronics. Nanostructured materials. Conference papers and proceedings.