Advanced Etch Technology for Nanopatterning V : 22-23 February 2016, San Jose, California, United States / Qinghuang Lin, Sebastian U. Engelmann, editors ; sponsored by SPIE.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Author:	SPIE (Society) (sponsoring body.)
Other Authors:	Lin, Qinghuang, 1963- (Editor), Engelmann, Sebastian U. (Editor)
Format:	eBook
Language:	English
Published:	Bellingham, Washington : SPIE, [2016]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 9782.
Subjects:	Plasma etching > Congresses. Semiconductors > Etching > Congresses. Nanoelectronics > Congresses. Nanoelectronics. Plasma etching. Semiconductors > Etching. Conference papers and proceedings.

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Call Number:	TA2005
TA2005	Available