Advanced etch technology for nanopatterning III : 24-25 February 2014, San Jose, California, United States / Gottlieb S. Oehrlein, Qinghuang Lin, editors ; sponsored by SPIE ; cosponsored by LAM Research Corp. (United States) ; published by SPIE.

Saved in:

Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Author:	SPIE (Society) (sponoring body.)
Other Authors:	Oehrlein, Gottlieb S. (Editor), Lin, Qinghuang, 1963- (Editor)
Other title:	Advanced etch technology for nanopatterning 3. Advanced etch technology for nanopatterning three.
Format:	eBook
Language:	English
Published:	Bellingham, Washington : SPIE, [2014]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 9054.
Subjects:	Plasma etching > Congresses. Semiconductors > Etching > Congresses. Nanoelectronics > Congresses. Nanoelectronics. Plasma etching. Semiconductors > Etching. Conference papers and proceedings.

Internet

Holdings details from Online
Call Number:	TA2005 .A38 2014e
TA2005 .A38 2014e	Available