Plasma Processing of SRF Cavities for the next Generation Of Particle Accelerators [electronic resource]
The cost-effective production of high frequency accelerating fields are the foundation for the next generation of particle accelerators. The Ar/Cl2 plasma etching technology holds the promise to yield a major reduction in cavity preparation costs. Plasma-based dry niobium surface treatment provides...
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| Online Access: |
Online Access (via OSTI) |
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| Format: | Government Document Electronic eBook |
| Language: | English |
| Published: |
Washington, D.C. : Oak Ridge, Tenn. :
United States. Department of Energy. High Energy Physics Division ; distributed by the Office of Scientific and Technical Information, U.S. Department of Energy,
2015.
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| Subjects: |
Internet
Online Access (via OSTI)Online
| Call Number: |
E 1.99:doe-odurf--07879-1
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| E 1.99:doe-odurf--07879-1 | Available |