Chemical vapor deposition : thermal and plasma deposition of electronic materials / by S. Sivaram.
This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the...
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| Online Access: |
Full Text (via Springer) |
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| Main Author: | |
| Format: | eBook |
| Language: | English |
| Published: |
New York :
Springer Science+Business Media, LLC,
1995.
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| Subjects: |
| Summary: | This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the perspective of the properties of thin films and show how to achieve these properties by understanding and modifying deposition conditions. |
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| Item Description: | Originally published by Van Nostrand Reinhold in 1995. |
| Physical Description: | 1 online resource (xii, 292 pages) |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9781475747515 1475747519 |