Chemical vapor deposition : thermal and plasma deposition of electronic materials / by S. Sivaram.
This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the...
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Full Text (via Springer) |
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Format: | eBook |
Language: | English |
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New York :
Springer Science+Business Media, LLC,
1995.
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Internet
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Call Number: |
TK7836
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TK7836 | Available |