Chemical vapor deposition : thermal and plasma deposition of electronic materials / by S. Sivaram.
This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the...
Saved in:
| Online Access: |
Full Text (via Springer) |
|---|---|
| Main Author: | |
| Format: | eBook |
| Language: | English |
| Published: |
New York :
Springer Science+Business Media, LLC,
1995.
|
| Subjects: |
Internet
Full Text (via Springer)Online
| Call Number: |
TK7836
|
|---|---|
| TK7836 | Available |