Plasma processing of semiconductors /

Plasma processing of semiconductors / edited by P.F. Williams.

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Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage rang...

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Bibliographic Details
Online Access: Full Text (via Springer)
Corporate Authors: NATO Advanced Study Institute on Plasma Processing of Semiconductors Bonas, France, North Atlantic Treaty Organization. Scientific Affairs Division
Other Authors: Williams, P. F. (P. Frazer)
Format: Conference Proceeding eBook
Language:English
Published: Dordrecht ; Boston : Kluwer Academic Publishers, [1997]
Series:NATO ASI series. Applied sciences ; no. 336.
Subjects:
Plasma engineering > Congresses.
Semiconductors > Etching > Congresses.
Plasma etching > Industrial applications > Congresses.
Plasma chemistry > Industrial applications > Congresses.
Plasma chemistry > Industrial applications.
Plasma engineering.
Plasma etching > Industrial applications.
Semiconductors > Etching.
Conference papers and proceedings.
Table of Contents:
  • Introduction to plasma etching / T.D. Mantei
  • Plasma chemistry, basic processes and PECVD / D.L. Flamm
  • The role of ions in reactive ion etchng with low density plasmas / J.W. Coburn
  • SiO2 etching in high-density plasmas: differences with low-density plasmas / G.S. Oehrlein
  • Introduction to plasma enhanced chemical vapor deposition / T.S. Cale [and others]
  • Topography evolution during semiconductor processing / T.S. Cale [and others]
  • Deposition of amorphous silicon / J. Perrin
  • High density sources for plasma etching / T.D. Montei
  • Resonant plasma excitation by electron cyclotron waves--fundamentals and applications / H. Oechsner
  • The transition from capacitive to inductive to wave sustained discharges / R.W. Boswell [and others]
  • Physics of surface-wave discharges / J. Margot and M. Moisan
  • Surface science aspects of etching and wall reactions in high density plasmas / J.W. Coburn
  • Plasma-surface interactions / R. d'Agostino
  • Cl2 plasma-Si surface interactions plasma etching / V.M. Donnelly [and others]
  • Particle in cell Monte Carlo collision codes (PIC-MCC); methods and applications to plasma processing / C.K. Birdsall
  • Fluid and hybrid models of non equilibrium discharges / J.P. Boeuf and A. Merad
  • Optical diagnostics of processing plasmas / P.F. Williams
  • Optical diagnostics of plasmas: a tool for process control / N. Sadeghi, J. Derouard, and J.P. Booth
  • Infrared absorption spectroscopy as a diagnostic for processing plasmas / G.M.W. Kroesen
  • Ellipsometric analysis of plasma deposited and plasma etched materials / J.A. Woollam
  • Mass spectrometry of reactive plasmas / J. Perrin
  • Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications / R.W. Boswell . [and others]
  • Remote plasma processing / G.S. Oehrlein
  • Magnetized surface-wave discharges for submicrometer pattern transfer / J. Margot [and others]
  • Dusty plasmas: fundamental aspects and industrial applications / G.M.W. Kroesen
  • Low energy plasma beams for semiconductor technology / H. Oechsner
  • Process control concepts / S. Watts Butler
  • Issues and solutions for applying process control to semiconductor manufacturing / S. Watts Butler.

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