Plasma processing of semiconductors /

Plasma processing of semiconductors / edited by P.F. Williams.

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Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage rang...

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Bibliographic Details
Online Access: Full Text (via Springer)
Corporate Authors: NATO Advanced Study Institute on Plasma Processing of Semiconductors Bonas, France, North Atlantic Treaty Organization. Scientific Affairs Division
Other Authors: Williams, P. F. (P. Frazer)
Format: Conference Proceeding eBook
Language:English
Published: Dordrecht ; Boston : Kluwer Academic Publishers, [1997]
Series:NATO ASI series. Applied sciences ; no. 336.
Subjects:
Plasma engineering > Congresses.
Semiconductors > Etching > Congresses.
Plasma etching > Industrial applications > Congresses.
Plasma chemistry > Industrial applications > Congresses.
Plasma chemistry > Industrial applications.
Plasma engineering.
Plasma etching > Industrial applications.
Semiconductors > Etching.
Conference papers and proceedings.

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Call Number: TA2020 .P532 1997eb
TA2020 .P532 1997eb Available

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