Plasma processing of semiconductors / edited by P.F. Williams.
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage rang...
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| Online Access: |
Full Text (via Springer) |
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| Corporate Authors: | , |
| Other Authors: | |
| Format: | Conference Proceeding eBook |
| Language: | English |
| Published: |
Dordrecht ; Boston :
Kluwer Academic Publishers,
[1997]
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| Series: | NATO ASI series. Applied sciences ;
no. 336. |
| Subjects: |
| Summary: | Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge. |
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| Item Description: | "Proceedings of the NATO Advanced Study Institute on Plasma Processing of Semiconductors, Château de Bonas, France, 17-18-June, 1996"--Title page verso. "Published in cooperation with the NATO Scientific Affairs Division." |
| Physical Description: | 1 online resource (x, 613 pages) : illustrations. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9789401158848 9401158843 |