Low temperature CVD of TaB₂

Low temperature CVD of TaB₂ [electronic resource]

Crystalline TaB₂ has been deposited using the CVD reaction of TaCl₅ and B₂H₆ in the temperature range of 773-1200°K. Thermodynamic calculations have been made which compare the use of both B₂H₆ and BCl₃ as B source gases. The deposits obtained with B₂H₆ exhibited extremely small crystal size and con...

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Bibliographic Details
Online Access: Online Access
Corporate Authors: Sandia Laboratories (Researcher), Sandia National Laboratories (Researcher)
Format: Government Document Electronic eBook
Language:English
Published: Albuquerque, N.M. : Oak Ridge, Tenn. : Sandia National Laboratories. ; distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy, 1980.
Subjects:
Deposition.
Chlorine Compounds.
Boron Chlorides.
Tantalum Carbides.
Carbides.
Boron Compounds.
Tantalum Borides.
Transition Element Compounds.
Boron Hydrides.
Carbon Compounds.
Hydrides.
Tantalum Compounds.
Hardness.
Halogen Compounds.
Borides.
Halides.
Temperature Effects.
Microhardness.
Chemical Coating.
Crystal Structure.
Chlorides.
Chemical Vapor Deposition.
Surface Coating.
Mechanical Properties.
Tantalum Chlorides.
Hydrogen Compounds.
Materials Science.

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Call Number: E 1.99: conf-800439-1
E 1.99: conf-800439-1 Available

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