High power impulse magnetron sputtering and related discharges scalable plasma sources for plasma-based ion implantation and deposition.

High power impulse magnetron sputtering and related discharges [electronic resource] : scalable plasma sources for plasma-based ion implantation and deposition.

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High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the...

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Bibliographic Details
Online Access: Online Access
Corporate Author: Lawrence Berkeley National Laboratory (Researcher)
Format: Government Document Electronic eBook
Language:English
Published: Berkeley, Calif. : Oak Ridge, Tenn. : Lawrence Berkeley National Laboratory ; distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy, 2009.
Subjects:
Deposition.
Processing.
Mixtures.
Atoms.
Plasma.
Substrates.
Ion Implantation.
Sputtering.
Magnetrons.
Thin Films.
Etching.

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Call Number: E 1.99:lbnl-2550e
E 1.99:lbnl-2550e Available

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