Direct single ion machining of nanopores. [electronic resource]
The irradiation of thin insulating films by high-energy ions (374 MeV Au{sup +25} or 241 MeV I{sup +19}) was used to attempt to form nanometer-size pores through the films spontaneously. Such ions deposit a large amount of energy into the target materials (≈20 keV/nm), which significantly disrupts t...
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| Online Access: |
Online Access (via OSTI) |
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| Corporate Author: | |
| Format: | Government Document Electronic eBook |
| Language: | English |
| Published: |
Washington, D.C. : Oak Ridge, Tenn. :
United States. Department of Energy. ; distributed by the Office of Scientific and Technical Information, U.S. Department of Energy,
2004.
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| Subjects: |
Internet
Online Access (via OSTI)Online
| Call Number: |
E 1.99:sand2004-5090
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| E 1.99:sand2004-5090 | Available |