Angle Resolved X-ray Photoelectron Spectroscopy of 2-methyl-4-nitroanaline Thin Films

Angle Resolved X-ray Photoelectron Spectroscopy of 2-methyl-4-nitroanaline Thin Films [electronic resource]

Angle-resolved XPS (ARXPS) was performed on thin films of 2-methyl-4-nitroanaline (MNA) vapor deposited onto a Si(001) substrate. The relative concentrations of the different components observed in the MNA film at takeoff angles of 30 and 90 degrees was determined. This allows an estimation of the l...

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Bibliographic Details
Online Access: Online Access (via OSTI)
Corporate Author: Thomas Jefferson National Accelerator Facility (U.S.) (Researcher)
Format: Government Document Electronic eBook
Language:English
Published: Washington, D.C. : Oak Ridge, Tenn. : United States. Department of Energy. Office of Energy Research ; distributed by the Office of Scientific and Technical Information, U.S. Department of Energy, 2002.
Subjects:
Photoelectron Spectroscopy.
Thin Films.
Nitro Compounds.
Vapor Deposited Coatings.
Silicon.
X-Ray Spectroscopy.
Substrates.
Materials Science.

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Call Number: E 1.99: doe/er/40150-2041
E 1.99: doe/er/40150-2041 Available

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