High sensitivity actinic detection of native defects on extreme ultraviolet lithography mask blanks [electronic resource]

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Bibliographic Details
Online Access:	Online Access
Corporate Author:	Lawrence Berkeley National Laboratory (Researcher)
Format:	Government Document Electronic eBook
Language:	English
Published:	Washington, D.C. : Oak Ridge, Tenn. : United States. Department of Energy. ; distributed by the Office of Scientific and Technical Information, U.S. Department of Energy, 2001.
Subjects:	Defects. Detection. Sensitivity. Extreme Ultraviolet Radiation. Masking. Substrates. Engineering. Materials Science.

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Call Number:	E 1.99:lbnl--48868
E 1.99:lbnl--48868	Available