Spectroscopic ellipsometry characterization of thin-film silicon nitride

Spectroscopic ellipsometry characterization of thin-film silicon nitride [electronic resource]

We have measured and analyzed the optical characteristics of a series of silicon nitride thin films prepared by plasma-enhanced chemical vapor deposition on silicon substrates for photovoltaic applications. Spectroscopic ellipsometry measurements were made by using a two-channel spectroscopic polari...

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Bibliographic Details
Online Access: Online Access
Corporate Author: Oak Ridge National Laboratory. (Researcher)
Format: Government Document Electronic eBook
Language:English
Published: Washington, D.C. : Oak Ridge, Tenn. : United States. Dept. of Energy. Office of Energy Research ; distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy, 1997.
Subjects:
Silicon Nitrides.
Optical Properties.
Antireflection Coatings.
Ellipsometry.
Thin Films.
Voids.
Roughness.
Silicon Solar Cells.
Materials Science ;14 Solar Energy.

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Call Number: E 1.99:CONF-9705124--2
E 1.99:CONF-9705124--2 Available

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