Handbook of plasma processing technology [electronic resource] : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
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| Online Access: |
Full Text (via Knovel) |
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| Other Authors: | , , |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Park Ridge, N.J. :
Noyes Publications,
©1990.
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| Series: | Materials science and process technology series.
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| Subjects: |
Internet
Full Text (via Knovel)Online
| Call Number: |
TA2020 .H37 1990eb
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| TA2020 .H37 1990eb | Available |