Data analysis and modeling for process control [electronic resource] : 26-27 February 2004, Santa Clara, California, USA / Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors:	Tobin, Kenneth W. (Editor)
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash., USA : SPIE, ©2004.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5378.
Subjects:	Manufacturing processes > Mathematical models > Congresses. Manufacturing processes > Automatic control > Congresses. Intelligent control systems > Mathematical models > Congresses. Process control > Mathematical models > Congresses. Manufacturing processes > Mathematical models. Manufacturing processes > Automatic control. Intelligent control systems. Mathematical models. Process control > Mathematical models. Conference papers and proceedings.

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Holdings details from Online
Call Number:	TS173 .D83 2004
TS173 .D83 2004	Available