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920107s1990 dcua bb f000 0 eng d |
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|a (OCoLC)ocm25060756
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|a N 90-20393
|b NASA
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|a OKX
|b eng
|c OKX
|d OCL
|d OCLCQ
|d GPO
|d OCLCQ
|d OCLCF
|d OCLCO
|d OCLCQ
|d MTG
|d GPO
|d MvI
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|a COD9
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|a 0830-D (MF)
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|a NAS 1.15:102544
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| 086 |
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|a NAS 1.15:102544
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| 245 |
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|a Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP
|h [microform] /
|c Dragan M. Pantic [and others] ; presented at the Dielectric Films on Compound Semiconductors Symposium sponsored by the Electrochemical Society, Honolulu, Hawaii, October 18-23, 1987.
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| 264 |
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1 |
|a [Washington, D.C.] :
|b NASA ;
|a Springfield, Va. :
|b For sale by the National Technical Information Service,
|c [1990]
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| 300 |
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|a 15 pages :
|b illustrations ;
|c 28 cm.
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| 336 |
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|a text
|b txt
|2 rdacontent.
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| 337 |
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|a microform
|b h
|2 rdamedia.
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| 338 |
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|a microfiche
|b he
|2 rdacarrier.
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| 490 |
1 |
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|a NASA technical memorandum ;
|v 102544.
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| 500 |
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|a Cover title.
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| 504 |
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|a Includes bibliographical references (page 13)
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| 533 |
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|a Microfiche.
|b [Washington, D.C. :
|c National Aeronautics and Space Administration],
|d 1990.
|e 1 microfiche : negative.
|
| 650 |
|
7 |
|a Capacitance-voltage characteristics.
|2 nasat.
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| 650 |
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7 |
|a Electron beams.
|2 nasat.
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| 650 |
|
7 |
|a Indium phosphides.
|2 nasat.
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| 650 |
|
7 |
|a Irradiation.
|2 nasat.
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| 650 |
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7 |
|a Phosphorus.
|2 nasat.
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| 650 |
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7 |
|a Plasmas (physics)
|2 nasat.
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| 650 |
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7 |
|a Radiation damage.
|2 nasat.
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| 650 |
|
7 |
|a Vapor deposition.
|2 nasat.
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| 700 |
1 |
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|a Pantic, Dragan M.
|0 http://id.loc.gov/authorities/names/no2007082720
|1 http://isni.org/isni/0000000050620380.
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| 710 |
2 |
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|a Electrochemical Society.
|0 http://id.loc.gov/authorities/names/n79139285
|1 http://isni.org/isni/0000000123643007.
|
| 710 |
1 |
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|a United States.
|b National Aeronautics and Space Administration.
|0 http://id.loc.gov/authorities/names/n78087581
|1 http://isni.org/isni/0000000449071619.
|
| 711 |
2 |
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|a Symposium on Dielectric Films on Compound Semiconductors.
|0 http://id.loc.gov/authorities/names/n85170961.
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| 776 |
0 |
8 |
|i Online version:
|a Pantic, Dragan M.
|t Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP
|w (OCoLC)994303469.
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| 830 |
|
0 |
|a NASA technical memorandum ;
|v 102544.
|0 http://id.loc.gov/authorities/names/n83707893.
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| 907 |
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|a .b3473935x
|b 07-06-22
|c 11-11-02
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| 998 |
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|a gov
|b 02-21-07
|c -
|d m
|e -
|f eng
|g dcu
|h 0
|i 3
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| 907 |
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|a .b3473935x
|b 05-15-20
|c 11-11-02
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| 944 |
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|a MARS - RDA ENRICHED
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| 999 |
f |
f |
|i b272b4b8-bac7-5248-8845-ae65f66e58da
|s 4f3de81c-14a3-5ecc-a3fc-3e883637ea1e
|
| 952 |
f |
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|p Can circulate
|a University of Colorado Boulder
|b Boulder Campus
|c Norlin
|d Norlin Library - Government Information - Microform
|e NAS 1.15:102544
|h Superintendent of Documents classification
|i document
|n 1
|
