Use of photostress to analyze behavior of an aft skirt test specimen [microform] / prepared by S.C. Gambrell, Jr.

Saved in:

Bibliographic Details
Main Author:	Gambrell, S. C.
Corporate Author:	United States. National Aeronautics and Space Administration
Format:	Government Document Microfilm Book
Language:	English
Published:	Tuscaloosa, Ala. : [Washington, DC] : [Springfield, Va.] : The University of Alabama, College of Engineering, Bureau of Engineering Research ; [National Aeronautics and Space Administration] ; [National Technical Information Center, distributor], [1994]
Series:	NASA contractor report ; NASA CR-195850. BER report ; no. 607-97.
Subjects:	Photoelastic analysis. Photostresses. Skirts. Space shuttle boosters. Strain distribution. Stress analysis. Welded joints.

Norlin Library - Government Information - Microform

Holdings details from Norlin Library - Government Information - Microform
Call Number:	NAS 1.26:195850
NAS 1.26:195850	Restricted Place a Hold