Computational lithography [electronic resource] / Xu Ma and Gonzalo R. Arce.
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since t...
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| Online Access: |
Full Text (via Wiley) |
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| Format: | Electronic eBook |
| Language: | English |
| Published: |
Hoboken, N.J. :
Wiley,
©2010.
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| Series: | Wiley series in pure and applied optics.
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| Subjects: |
Internet
Full Text (via Wiley)Online
| Call Number: |
TK7872.M3 C66 2010
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| TK7872.M3 C66 2010 | Available |