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  1. 1

    Metal multilayer mirrors for EUV wide field telescopes

    Published 1989
    Online Access
    Government Document Electronic eBook
  2. 2

    Study of impurities in the Tandem Mirror Experiment using extreme-ultraviolet spectroscopy

    Published 1982
    Online Access
    Government Document Electronic eBook
  3. 3

    Imaging XUV spectroscopy of a Z-pinch plasma in the former Soviet Union

    Published 1993
    Online Access
    Government Document Electronic eBook
  4. 4

    Beam line design for synchrotron spectroscopy in the VUV

    Published 1980
    Online Access
    Government Document Electronic eBook
  5. 5

    Use of diamond-turned mirrors for synchrotron radiation (SR)

    Published 1981
    Online Access
    Government Document Electronic eBook
  6. 6

    Initial development of efficient, low-debris laser targets for the Sandia soft x-ray projection lithography effort

    Published 1997
    Online Access
    Government Document Electronic eBook
  7. 7

    Development of XUV-interferometry (155 {angstrom}) using a soft x-ray laser

    Published 1995
    Online Access
    Government Document Electronic eBook
  8. 8

    Masks for extreme ultraviolet lithography

    Published 1998
    Online Access (via OSTI)
    Government Document Electronic eBook
  9. 9

    Development of the MIT tabletop soft x-ray laser

    Published 1991
    Online Access
    Government Document Electronic eBook
  10. 10

    Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography

    Published 1999
    Online Access (via OSTI)
    Government Document Electronic eBook
  11. 11

    On orbit performance of the ALEXIS EUV telescopes

    Published 1994
    Online Access
    Government Document Electronic eBook
  12. 12

    Tunable, narrow bandwidth 83 nm light source

    Published 1980
    Online Access
    Government Document Electronic eBook
  13. 13

    Surface and submicron physics

    Published 1982
    Online Access
    Government Document Electronic eBook
  14. 14

    Extreme Ultraviolet Phase Contrast Imaging

    Published 2005
    Online Access
    Government Document Electronic eBook
  15. 15

    High sensitivity actinic detection of native defects on extreme ultraviolet lithography mask blanks

    Published 2001
    Online Access
    Government Document Electronic eBook
  16. 16
  17. 17

    Actinic defect counting statistics over 1 cm2 area of EUVL mask blank

    Published 2000
    Online Access
    Government Document Electronic eBook
  18. 18

    System integration and performance of the EUV engineering test stand

    Published 2001
    Online Access
    Government Document Electronic eBook
  19. 19

    Operation of a Free-Electron Laser from the Extreme Ultraviolet to the Water Window

    Published 2007
    Online Access (via OSTI)
    Government Document Electronic eBook
  20. 20

    The SEMATECH Berkeley microfield exposure tool learning a the 22-nm node and beyond.

    Published 2009
    Online Access
    Government Document Electronic eBook
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