NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies / edited by M. Gentili, C. Giovannella, S. Selci.
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new fu...
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Other title: | Proceedings of the NATO Advanced Research Workshop, Frascati, Roma, Italy, April 6--8, 1993. |
Format: | eBook |
Language: | English |
Published: |
Dordrecht :
Springer Netherlands,
1994.
|
Series: | NATO ASI series. Applied sciences ;
264. |
Subjects: |
Table of Contents:
- Content
- Electron Beam Lithography
- Nanolithography, The Integrated System
- Electron Beam Resists and Pattern Transfer Methods
- Nanolithography Developed Through Electron-Beam-Induced Surface Reaction
- Direct Writing of Nanoscale Patterns in SiO2
- Sub-10 nm Electron Beam Lithography: -AlF-Doped Lithium Fluoride as a Resist
- Surface Imaging for EB-Nanolithography
- Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier
- Fabrication of Ultrasmail InGaAslInP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching
- Fabrication, Investigation and Manipulation of Artificial Nanostructures
- Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition
- Nanolithography Requirements
- An Equipment Manufacturers View
- X-Ray Lithography
- X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing
- X-Ray Phase Shifting Masks
- Fabrication of X-Ray Mask for Nanolithography by EBL
- Ion Beam Lithography
- Intense Focused Ion Beams for Nanostructurisation
- Latest Results Obtained with the Alpha Ion Projection Machine
- STM Lithography
- Direct Writing with a Combined STM/SEM System
- Low Voltage E-Beam Lithography with the Scanning Tunneling Microscope
- STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide
- Sub-20 nm Lithographic Patterning with the STM
- Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope
- Author Index.