NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies / edited by M. Gentili, C. Giovannella, S. Selci.
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new fu...
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| Other title: | Proceedings of the NATO Advanced Research Workshop, Frascati, Roma, Italy, April 6--8, 1993. |
| Format: | eBook |
| Language: | English |
| Published: |
Dordrecht :
Springer Netherlands,
1994.
|
| Series: | NATO ASI series. Applied sciences ;
264. |
| Subjects: |
MARC
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| 245 | 1 | 0 | |a NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies / |c edited by M. Gentili, C. Giovannella, S. Selci. |
| 246 | 3 | |a Proceedings of the NATO Advanced Research Workshop, Frascati, Roma, Italy, April 6--8, 1993. | |
| 260 | |a Dordrecht : |b Springer Netherlands, |c 1994. | ||
| 300 | |a 1 online resource (xii, 215 pages) | ||
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| 490 | 1 | |a NATO ASI Series, Series E: Applied Sciences, |x 0168-132X ; |v 264. | |
| 505 | 0 | |a Content -- Electron Beam Lithography -- Nanolithography, The Integrated System -- Electron Beam Resists and Pattern Transfer Methods -- Nanolithography Developed Through Electron-Beam-Induced Surface Reaction -- Direct Writing of Nanoscale Patterns in SiO2 -- Sub-10 nm Electron Beam Lithography: -AlF-Doped Lithium Fluoride as a Resist -- Surface Imaging for EB-Nanolithography -- Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier -- Fabrication of Ultrasmail InGaAslInP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching -- Fabrication, Investigation and Manipulation of Artificial Nanostructures -- Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition -- Nanolithography Requirements -- An Equipment Manufacturers View -- X-Ray Lithography -- X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing -- X-Ray Phase Shifting Masks -- Fabrication of X-Ray Mask for Nanolithography by EBL -- Ion Beam Lithography -- Intense Focused Ion Beams for Nanostructurisation -- Latest Results Obtained with the Alpha Ion Projection Machine -- STM Lithography -- Direct Writing with a Combined STM/SEM System -- Low Voltage E-Beam Lithography with the Scanning Tunneling Microscope -- STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide -- Sub-20 nm Lithographic Patterning with the STM -- Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope -- Author Index. | |
| 520 | |a Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL) | ||
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| 650 | 7 | |a Surfaces (Physics) |2 fast |0 (OCoLC)fst01139265. | |
| 700 | 1 | |a Giovannella, C. | |
| 700 | 1 | |a Selci, S. | |
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