NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies / edited by M. Gentili, C. Giovannella, S. Selci.
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new fu...
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| Online Access: |
Full Text (via Springer) |
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| Main Author: | |
| Other Authors: | , |
| Other title: | Proceedings of the NATO Advanced Research Workshop, Frascati, Roma, Italy, April 6--8, 1993. |
| Format: | eBook |
| Language: | English |
| Published: |
Dordrecht :
Springer Netherlands,
1994.
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| Series: | NATO ASI series. Applied sciences ;
264. |
| Subjects: |
| Summary: | Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL) |
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| Physical Description: | 1 online resource (xii, 215 pages) |
| ISBN: | 9789401582612 9401582610 |
| ISSN: | 0168-132X ; |