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REMOVAL OF IMPURITIES FROM URANIUM HEXAFLUORIDE BY SELECTIVE SORPTION TECHNIQUES. Progress Report for 1966. [electronic resource]

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Bibliographic Details
Online Access:	Online Access
Corporate Author:	Oak Ridge Gaseous Diffusion Plant (Researcher)
Format:	Government Document Electronic eBook
Language:	English
Published:	Oak Ridge, Tenn. : Oak Ridge, Tenn. : Oak Ridge Gaseous Diffusion Plant ; distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy, 1967.
Subjects:	Uranium Hexafluoride. Tantalum Fluorides. Separation Processes. Antimony Fluorides. Efficiency. Aluminum Fluorides. Ruthenium Fluorides. High Temperature. Niobium Fluorides. Impurities. Magnesium Fluorides. Vapors Lithium Fluorides. Adsorption. Titanium Fluorides. Temperature. Sodium Fluorides.

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Call Number:	E 1.99:k--1713
E 1.99:k--1713	Available