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E 1.99: conf-9410192--1
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Progress in ultrafast scanning probe microscopy |
1 |
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E 1.99: conf-9410193--1
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User guide to the Burner Engineering Research Laboratory |
1 |
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E 1.99: conf-9410194--1
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Defect classes - an overdue paradigm for CMOS IC testing |
1 |
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E 1.99: conf-9410195--1
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Complementary GaAs junction-gated heterostructure field effect transistor technology |
1 |
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E 1.99: conf-9410195--2
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Technologies for highly parallel optoelectronic integrated circuits |
1 |
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E 1.99: conf-9410196--1
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Fractal nature and scaling of normal faults, Rio Grande rift, NM Implications for growth and strain. |
1 |
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E 1.99: conf-9410197--1
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Representing manufacturing features to support design and process changes |
1 |
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E 1.99: conf-9410197--2
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Integrated product definition representation for agile numerical control applications |
1 |
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E 1.99: conf-9410199--1
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Gate oxide shorts in nMOS transistors Electrical properties and lifetime prediction method. |
1 |
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E 1.99: conf-9410200--1
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Complex oxidation effects in polymer degradation |
1 |
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E 1.99:conf-9410201--
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High-tech controls for energy and environment. Proceedings |
1 |
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E 1.99: conf-9410202--1
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High temperature solid lubricant materials for heavy duty and advanced heat engines |
1 |
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E 1.99: conf-9410203--1
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The influence of chemistry and microstructure on the fracture toughness of V-V₃Si in-situ composites |
1 |
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E 1.99: conf-9410204--1
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Automatically generating procedure code and database maintenance scripts |
1 |
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E 1.99: conf-9410204--2
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Squeezing out all the performance Using Ingres for a C³I reporting system. |
1 |
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E 1.99: conf-9410205--1
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Simulation of concrete perforation based on a continuum damage model |
1 |
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E 1.99: conf-9410207--1
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Determination of the concentration and isotopic composition of uranium in environmental air filters |
1 |
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E 1.99:CONF-9410207--2
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Determination of total and isotopic uranium by inductively coupled plasma-mass spectrometry at the Fernald Environmental Management Project |
1 |
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E 1.99: conf-9410208--1
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Establishing maintenance performance indicators |
1 |
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E 1.99: conf-9410210--1
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Innovative technology for contamination control in plasma processing |
1 |
